Inspection microscope for semiconductors

Additional Details

The optical system that was originally developed for the best-selling FS60 models was further enhanced for the FS70 models. It is ideal as the microscope unit of a prober station for semiconductors. (All models CE marked.) • The FS70L supports three types of YAG laser wavelength ranges (1064nm, 532nm and 355nm), while the FS70L4 supports two types of wavelength ranges (532nm and 266nm), thus expanding the scope of laser applications, allowing laser-cutting of thin-films used in semiconductors and liquid crystal substrates. Bright field, Differential Interference Contrast (DIC) and polarized observations are standard with the FS70Z. The FS70L and FS70L4 do not support the DIC method. • By employing an inward turret, the long working distance objectives provide excellent operability. • An ergonomic design with superb operability: the FS70 employs the erectimage optical system (the image in the field of view has the same orientation as the specimen) and enlarged fine focus adjustment wheel with rubber grip coarseadjustmentThe optical system that was originally developed for the best-selling FS60 models was further enhanced for the FS70 models. It is ideal as the microscope unit of a prober station for semiconductors. (All models CE marked.) • The FS70L supports three types of YAG laser wavelength ranges (1064nm, 532nm and 355nm), while the FS70L4 supports two types of wavelength ranges (532nm and 266nm), thus expanding the scope of laser applications, allowing laser-cutting of thin-films used in semiconductors and liquid crystal substrates. Bright field, Differential Interference Contrast (DIC) and polarized observations are standard with the FS70Z. The FS70L and FS70L4 do not support the DIC method. • By employing an inward turret, the long working distance objectives provide excellent operability. • An ergonomic design with superb operability: the FS70 employs the erectimage optical system (the image in the field of view has the same orientation as the specimen) and enlarged fine focus adjustment wheel with rubber grip coarseadjustmentThe optical system that was originally developed for the best-selling FS60 models was further enhanced for the FS70 models. It is ideal as the microscope unit of a prober station for semiconductors. (All models CE marked.) • The FS70L supports three types of YAG laser wavelength ranges (1064nm, 532nm and 355nm), while the FS70L4 supports two types of wavelength ranges (532nm and 266nm), thus expanding the scope of laser applications, allowing laser-cutting of thin-films used in semiconductors and liquid crystal substrates. Bright field, Differential Interference Contrast (DIC) and polarized observations are standard with the FS70Z. The FS70L and FS70L4 do not support the DIC method. • By employing an inward turret, the long working distance objectives provide excellent operability. • An ergonomic design with superb operability: the FS70 employs the erectimage optical system (the image in the field of view has the same orientation as the specimen) and enlarged fine focus adjustment wheel with rubber grip coarseadjustmentThe optical system that was originally developed for the best-selling FS60 models was further enhanced for the FS70 models. It is ideal as the microscope unit of a prober station for semiconductors. (All models CE marked.) • The FS70L supports three types of YAG laser wavelength ranges (1064nm, 532nm and 355nm), while the FS70L4 supports two types of wavelength ranges (532nm and 266nm), thus expanding the scope of laser applications, allowing laser-cutting of thin-films used in semiconductors and liquid crystal substrates. Bright field, Differential Interference Contrast (DIC) and polarized observations are standard with the FS70Z. The FS70L and FS70L4 do not support the DIC method. • By employing an inward turret, the long working distance objectives provide excellent operability. • An ergonomic design with superb operability: the FS70 employs the erectimage optical system (the image in the field of view has the same orientation as the specimen) and enlarged fine focus adjustment wheel with rubber grip coarseadjustmentThe optical system that was originally developed for the best-selling FS60 models was further enhanced for the FS70 models. It is ideal as the microscope unit of a prober station for semiconductors. (All models CE marked.) • The FS70L supports three types of YAG laser wavelength ranges (1064nm, 532nm and 355nm), while the FS70L4 supports two types of wavelength ranges (532nm and 266nm), thus expanding the scope of laser applications, allowing laser-cutting of thin-films used in semiconductors and liquid crystal substrates. Bright field, Differential Interference Contrast (DIC) and polarized observations are standard with the FS70Z. The FS70L and FS70L4 do not support the DIC method. • By employing an inward turret, the long working distance objectives provide excellent operability. • An ergonomic design with superb operability: the FS70 employs the erectimage optical system (the image in the field of view has the same orientation as the specimen) and enlarged fine focus adjustment wheel with rubber grip coarseadjustment